RF & DC Sputtering System
Sputtering is a widely used and highly versatile vacuum coating system used for the deposition of a variety of coating materials. Sputtering Deposition Systems use high energy particles as a way of transferring kinetic energy to a target in order to remove material for deposition. For sputtering, the energized particles are present as a glow diffuse plasma.
Dinesh high vacuumengineering manufactures different size cathodes from 1' to 4'. Our cathodes are flexi mount with confocal arrangement. Magnetrons have capability of accommodating 1-6 mm thick targets.
