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Vacuum Thin Film Coating Unit : DHVEoffers Vacuum Thin Film Coating Unit for Laboratory and Industrial Purpose.Essentially there are two types. Thin Film Coating Unit. RF & DC Sputtering Unit Vacuum Coater produces thin, homogenous, uniform, pure film coatings of various metals to achieve controlled effects in applications like optics, electronics, materials, thin film coating etc. DHVE offers Different size of Vacuum Thin Film Coating Unit Model 12A4, 15F6, 19F9 & 24F10 with facilities for thermal evaporation, Ion cleaning (bombardment), etc. with accessories for substrate heating, rotation, film thickness monitoring etc. This is a versatile unit both for production as well as research. Optional accessories increase the versatility of the unit making it suitable for a variety of applications, including optical thin film deposition, semiconductors, and micro-electronics. A high speed vacuum pumping system fully integrated with necessary piping and valves operated manually is rated for high gas through- put handling and to produce clean and high vacuum in the chamber. This Vacuum Coating system is wired to operate on 230 V AC, 50Hz single phase power supply / 415 V AC 3 phase power sup
Digital Penning Gauge - DHVE Thisis a cold cathode Ionisation gauge consisting of two electrodes anode and cathode. A potential difference of about 2.2 KV is applied between anode and cathode through current limiting resistors. A magnetic field is introduced at right angles to the plane of the electrodes by a permanent magnet having nearly 800 gauss magnetic field which will increase the ionisation current. The electrons emitted from the cathode (gauge head body) of the gauge head are deflected by means of magnetic field applied at right angles to the plane of the electrodes and are made to take helical path before reaching the anode loop. Thus following very long path, the chance of collision with gas molecule is high even at low pressures. The secondary electrons produced by ionisation themselves perform similar oscillations and the rate of ionisation increases rapidly. Eventually, the electrons are captured by the anode and equilibrium is reached when the number of electrons produced per second by ionisation is the sum of positive ion current to the cathode and the electron current to the anode and is used to measure the pressure of the gas. This instrument with the sensor having wider range of applications, in high vacuum systems where the final Vacuum to be measured in process chamber. These instruments can be used in high vacuum systems, coating units, sputtering units, vacuum furnaces and many other applications where high vacuum to be measured in the range of 10-2 to 10-6 m.bar.
industrial vacuum pumps manufacturers vacuum pressure pumps high vacuum pumps dry vacuum pumps refrigeration vacuum pumps laboratory vacuum pumps industrial vacuum cleaners automotive vacuum pumpsDINESH High VACUUM ENGINREEING 1/3448A, st. no. 5, Ramnagar, Mandoli Road Shahdara Delhi 110032 Mob. +91-9818085534 Mob. +91-9958104228 Email: vacuumdk@gmail.com Email: salesvacuum@gmail.com http://www.dhve.in/
Components Whatever maybe your requirement of Component Hardwares , DHVEhas the capability to deliver almost all the components and some of the typical components towards Vacuum applications are as below in addition to the pictorial depiction. KF Couplings KF 10/16/25/40/50 Moisture Trap (MOT) Size: 25/50mm Fore Line Trap (FT) Size: 25/50 mm Liquid Nitrogen Trap (LNT) Water Cooled Condenser Inlet Dust Filter Oil Mist Filter
ANALOG PIRANI VACUUM GAUGE DHVE pirani gauges have very wide range of applications where the vacuum measurement needs to be carried between 0.5 mbar to 0.001 mbar. Working principle: The sensor tube of the pirani gauge head consists of a high temperature co-efficient resistance filament. The filament is heated with a constant voltage supply. The variation in pressure in vacuum line causes changes concentration of gas molecules present , in turn the variation in the thermal conductivity of the gas. Hence the heat loss of the electrically heated filament varies with respect to the pressure. This filament is constructed as an arm of the wheat stone bridge. A slight change in system pressure brings larger change in filament resistivity resulting in an imbalance of the bridge. this bridge imbalance current is a measure of pressure which is properly conditioned and displayed on the analog meter.
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