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Vacuum Thin Film Coating Unit : DHVEoffers Vacuum Thin Film Coating Unit for Laboratory and Industrial Purpose.Essentially there are two types. Thin Film Coating Unit. RF & DC Sputtering Unit Vacuum Coater produces thin, homogenous, uniform, pure film coatings of various metals to achieve controlled effects in applications like optics, electronics, materials, thin film coating etc. DHVE offers Different size of Vacuum Thin Film Coating Unit Model 12A4, 15F6, 19F9 & 24F10 with facilities for thermal evaporation, Ion cleaning (bombardment), etc. with accessories for substrate heating, rotation, film thickness monitoring etc. This is a versatile unit both for production as well as research. Optional accessories increase the versatility of the unit making it suitable for a variety of applications, including optical thin film deposition, semiconductors, and micro-electronics. A high speed vacuum pumping system fully integrated with necessary piping and valves operated manually is rated for high gas through- put handling and to produce clean and high vacuum in the chamber. This Vacuum Coating system is wired to operate on 230 V AC, 50Hz single phase power supply / 415 V AC 3 phase power sup
• Vacuum Pump in delhi • Vacuum Measuring Instruments in delhi • Diffusion Pump in delhi • Gas Charging Unit in delhi • Vacuum Coating Plant in delhi • Tungsten Coil in delhi • Vacuum Oil in delhi
• Vacuum Pump in india • Vacuum Measuring Instruments in india • Diffusion Pump in india • Gas Charging Unit in india • Vacuum Coating Plant in india • Tungsten Coil in india • Vacuum Oil in india
Vacuum Pump manufacture • Vacuum Measuring Instruments manufacture • Diffusion Pump manufacture • Gas Charging Unit manufacture • Vacuum Coating Plant manufacture • Tungsten Coil manufacture • Vacuum oil manufacture DIGITAL PIRANI GAUGE MANUFACTURE SILICON OILMANUFACTURE VACUUM GEGES MANUFACTURE
Digital Penning Gauge - DHVE Thisis a cold cathode Ionisation gauge consisting of two electrodes anode and cathode. A potential difference of about 2.2 KV is applied between anode and cathode through current limiting resistors. A magnetic field is introduced at right angles to the plane of the electrodes by a permanent magnet having nearly 800 gauss magnetic field which will increase the ionisation current. The electrons emitted from the cathode (gauge head body) of the gauge head are deflected by means of magnetic field applied at right angles to the plane of the electrodes and are made to take helical path before reaching the anode loop. Thus following very long path, the chance of collision with gas molecule is high even at low pressures. The secondary electrons produced by ionisation themselves perform similar oscillations and the rate of ionisation increases rapidly. Eventually, the electrons are captured by the anode and equilibrium is reached when the number of electrons produced per second by ionisation is the sum of positive ion current to the cathode and the electron current to the anode and is used to measure the pressure of the gas. This instrument with the sensor having wider range of applications, in high vacuum systems where the final Vacuum to be measured in process chamber. These instruments can be used in high vacuum systems, coating units, sputtering units, vacuum furnaces and many other applications where high vacuum to be measured in the range of 10-2 to 10-6 m.bar.
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